CCS-1000 Critical Cleaning System

Damage-Free Wafer Cleaning Beyond 65 nm

• Eliminate oxide etching



• Achieve unmatched cleaning performance



• Improve surface roughening--NO surface damage



• Create a paradigm shift



• Reduce operation costs--drastically



• Revolutionize cleaning processes



• Establish a green--and safe--environment--without any waste



• Eliminate expensive chemicals used in SC-1 and SC-2